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ICS:71.040.40
Showing 37–45 of 126 results
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ISO 16962:2017 Surface chemical analysis – Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry
CDN $312.00 Add to cart -
ISO 17109:2022 Surface chemical analysis – Depth profiling – Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
CDN $233.00 Add to cart -
ISO 17331:2004 Surface chemical analysis – Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
CDN $173.00 Add to cart -
ISO 17331:2010 Surface chemical analysis – Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy – Amendment 1
CDN $32.00 Add to cart -
ISO 17560:2014 Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth profiling of boron in silicon
CDN $115.00 Add to cart -
ISO 17862:2022 Surface chemical analysis – Secondary ion mass spectrometry – Linearity of intensity scale in single ion counting time-of-flight mass analysers
CDN $173.00 Add to cart -
ISO 17973:2024 Surface chemical analysis – Medium-resolution Auger electron spectrometers – Calibration of energy scales for elemental analysis
CDN $115.00 Add to cart -
ISO 17974:2002 Surface chemical analysis – High-resolution Auger electron spectrometers – Calibration of energy scales for elemental and chemical-state analysis
CDN $273.00 Add to cart -
ISO 18114:2021 Surface chemical analysis – Secondary-ion mass spectrometry – Determination of relative sensitivity factors from ion-implanted reference materials
CDN $76.00 Add to cart
