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“ISO 14706:2014 Surface chemical analysis – Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy” has been added to your cart. View cart
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ISO 13084:2018 Surface chemical analysis – Secondary ion mass spectrometry – Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
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ISO 13095:2014 Surface Chemical Analysis – Atomic force microscopy – Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement
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ISO 13424:2013 Surface chemical analysis – X-ray photoelectron spectroscopy – Reporting of results of thin-film analysis
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ISO 14167:2018 Gas analysis – General quality aspects and metrological traceability of calibration gas mixtures
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ISO 14187:2020 Surface chemical analysis – Characterization of nanostructured materials
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ISO 14237:2010 Surface chemical analysis – Secondary-ion mass spectrometry – Determination of boron atomic concentration in silicon using uniformly doped materials
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ISO 14606:2022 Surface chemical analysis – Sputter depth profiling – Optimization using layered systems as reference materials
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ISO 14701:2018 Surface chemical analysis – X-ray photoelectron spectroscopy – Measurement of silicon oxide thickness
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ISO 14706:2014 Surface chemical analysis – Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
0 out of 5CDN $233.00 Add to cart