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ICS:71.040.40
Showing 28–36 of 126 results
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ISO 15796:2005 Gas analysis – Investigation and treatment of analytical bias
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ISO 15969:2021 Surface chemical analysis – Depth profiling – Measurement of sputtered depth
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ISO 16129:2018 Surface chemical analysis – X-ray photoelectron spectroscopy – Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
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ISO 16242:2011 Surface chemical analysis – Recording and reporting data in Auger electron spectroscopy (AES)
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ISO 16243:2011 Surface chemical analysis – Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
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ISO 16268:2009 Surface chemical analysis – Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantation
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ISO 16413:2020 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry – Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
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ISO 16531:2020 Surface chemical analysis – Depth profiling – Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
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ISO 16664:2017 Gas analysis – Handling of calibration gases and gas mixtures – Guidelines
CDN $173.00 Add to cart
