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ICS:71.040.40
“ISO 21079:2008 Chemical analysis of refractories containing alumina, zirconia, and silica – Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) – Part 3: Flame atomic absorption spectrophotometry (FAAS) and inductively coupled plasma emission spectrometry (ICP -AES)” has been added to your cart. View cart
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ISO 21079:2008 Chemical analysis of refractories containing alumina, zirconia, and silica – Refractories containing 5 percent to 45 percent of ZrO2 (alternative to the X-ray fluorescence method) – Part 3: Flame atomic absorption spectrophotometry (FAAS) and inductively coupled plasma emission spectrometry (ICP -AES)
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ISO 21222:2020 Surface chemical analysis – Scanning probe microscopy – Procedure for the determination of elastic moduli for compliant materials using atomic force microscope and the two-point JKR method
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ISO 21270:2004 Surface chemical analysis – X-ray photoelectron and Auger electron spectrometers – Linearity of intensity scale
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ISO 22048:2004 Surface chemical analysis – Information format for static secondary-ion mass spectrometry
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ISO 22335:2007 Surface chemical analysis – Depth profiling – Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
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ISO 22415:2019 Surface chemical analysis – Secondary ion mass spectrometry – Method for determining yield volume in argon cluster sputter depth profiling of organic materials
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ISO 22581:2021 Surface chemical analysis – Near real-time information from the X-ray photoelectron spectroscopy survey scan – Rules for identification of, and correction for, surface contamination by carbon-containing compounds
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ISO 22933:2022 Surface chemical analysis – Secondary ion mass spectrometry – Method for the measurement of mass resolution in SIMS
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ISO 23124:2024 Surface chemical analysis – Measurement of lateral and axial resolutions of a Raman microscope
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